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Holwell Shuster & Goldberg Names Benjamin Heidlage Partner


New York, NY—Holwell Shuster & Goldberg LLP announced today that Benjamin Heidlage has been promoted to partner, effective January 1, 2018.

“Ben is a terrific addition to our partnership,” said Judge Richard Holwell, co-founder of Holwell Shuster & Goldberg. “His trial experience and passion for the law have proven a tremendous benefit to clients and colleagues alike, and he is a valued member of our growing team.”

Benjamin, 33, clerked for the Honorable Patrick Higginbotham of the U.S. Court of Appeals for the Fifth Circuit. At Holwell Shuster & Goldberg, he represents both individuals and corporations in contract, securities, and antitrust disputes in state and federal courts and arbitral tribunals. He is heavily involved in the firm’s representation of banks as trustees or securities administrators in various RMBS putback matters, each involving hundreds of millions of dollars, including the firm’s representation of the trustees in the Lehman bankruptcy. Recently, he also was a member of the team involved in a New York-based arbitration involving a commercial dispute between Japanese and Mexican parties, as well as the team representing a MacAndrews & Forbes company in a case involving a billion-dollar antitrust claim against News Corp. and its subsidiaries.

He has dedicated significant pro bono time to immigration matters, and serves as a co-chair of the Board of Directors of Atlas: DIY, which offers legal resources, educational programming, and social services to undocumented immigrant youth. He received a B.A. in politics from Pomona College, and his J.D. from New York University School of Law, where he graduated magna cum laude and served as an articles editor for the Law Review. He is a past recipient of the New York University Law Review Alumni Association Award, and has been recognized as a Rising Star by New York Metro Super Lawyers.

Before joining Holwell Shuster & Goldberg in 2014, Benjamin was an associate at Cravath, Swaine & Moore LLP.


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